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Glancing Angle Deposition (GLAD) technique has been used to fabricate the Ag nanoparticles (NPs) over TiO₂ thin film (TF) on the n-Si substrate. The deposited Ag NPs are in the size of 3-5 nm. Open-air annealing has been done at 500 °C and 600 °C for the n-Si/TiO₂ TF/Ag NP samples. High Resolution X-ray Diffraction (HRXRD) peaks were identified to calculate the crystalline size of the NPs and rutile phase of the annealed sample were exhibited. Morphological analysis has been done for the sample using Field Emission Scanning Electron Mi
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